Services

Research and Development

Pinch carries out scientific research in vacuum and plasma technologies and conducts R&D activities to develop instruments and devices for generating plasma and ion beams, as well as for comprehensive plasma diagnostics and analysis.

Plasma technologies represent a highly knowledge-intensive field that is indispensable to modern high-tech manufacturing and presents numerous technical challenges requiring advanced knowledge, extensive experience, comprehensive research, and meticulous analysis. Pinch is a company founded by a group of scientists, engineers, and specialists with vast experience in studying low-temperature plasma physics and performing highly complex research and development tasks.

We conduct research in a variety of areas, including:

  • Magnetron deposition of conductive and dielectric coatings using direct current (DC), mid-frequency pulsed (MF), radio-frequency (RF), high-power impulse magnetron sputtering (HiPIMS), and DOMS technologies.
  • Plasma immersion ion implantation (PIII). Plasma nitriding. Surface hardening of metals.
  • Investigation of particle energy and mass distributions in plasma, as well as control of ion fluxes incident on surfaces.
  • Ion surface modification of materials and formation of nano-, micro-, and macro-scale surface structures.

We help achieve the desired stoichiometric composition of deposited films, increase their adhesion and hardness, optimize coating deposition on complex-shaped parts, and determine the optimal position of the magnetron source within the vacuum chamber to maximize the deposition rate and improve film uniformity. Commercially available solutions are often insufficient to achieve the desired result. Pinch specializes in custom engineering solutions and brings new developments from concept to working hardware.

We conduct a wide range of R&D work on the development of:

  • ion and plasma sources;
  • vacuum systems;
  • sample holders for scientific and industrial research systems, with optional heating and cooling;
  • high-vacuum and ultra-high-vacuum automated motion feedthroughs;
  • particle energy and mass analyzers;
  • various probe systems, including Langmuir, double, triple, and Mach probes;
  • diagnostic tools for unique non-standard tasks.