LMS Magnetron

LMS is a magnetron source that delivers high deposition rates. It is intended for coating processes where high throughput or a large coating thickness is a key requirement. The magnetron discharge plasma heats the thermally insulated target to a temperature at which evaporation or sublimation occurs. This enables a substantial increase in film deposition rate. Deposition of the evaporated material allows films with virtually no internal stress to be formed and high-quality coatings up to several hundred micrometres thick to be produced. At a high flux of target material atoms, the discharge can be sustained in the target material vapour. This enables operation at reduced process gas pressure or without additional process gas supply, helping to improve film purity. At low power densities, deposition from a heated target without melting is possible, which is relevant to reactive processes. LMS is designed for operation with direct-current (DC), medium-frequency (MF), and pulsed power supplies, including HiPIMS mode.